silicet AG - chemical etching

Basic

Working surface: complete frontside
protected: Backside

PDF Download: Product Sheet | Instructions

Dimension	2"	3"	4"	5"	6"	8"
A - length	105 mm	135 mm	185 mm	200 mm	227 mm	260 mm
B - total width	65 mm	87 mm	132 mm	145 mm	160 mm	212 mm
C - width neck	65 mm	50 mm	80 mm	80 mm	80 mm	80 mm
D - thickness	12 mm	12 mm	12 mm	14 mm	14 mm	14 mm
E - compl. thickness	16 mm	16 mm	16 mm	18 mm	18 mm	18 mm
F - edge exclusion	5 mm	5 mm	5 mm	5 mm	5 mm	5 mm

Basic

Contacting: from backside
Contacts: within protected room
Working surface: complete frontside
protected: Backside

Horizontal

Horizontal wafer positioning during processing

BASIC:
Working surface: complete frontside
protected: Backside

PLUS
Working surface: frontside excl.
edge of 5 mm circumferential

125 + 156

BASIC-Twin
Stand Version
Simultaneous etching of 2 wafers
same size or different sizes

Working surface: complete frontside
protected: Backside

Batch Processing

All silicet Wafer Holders are batch-qualified.
Type BASIC as well as type PLUS, whether
the wafer will be held and protected
with or without vacuum

Single Clip

Wafer fixing by a clip-ring.
Wafer is kept, not protected

200 x 200

Flexible for clamping constant
or even different formates

Recticle Holder

To hold reticles while cleaning

Basic

Basic-Twin

Plus

Pieces

System

Basic

Plus

Trio

Horizontal

Stand

125 + 156

131 + 172

Batch Processing

Trio

Trio Clip

Single Clip

Twin Clip

Free

Net

200 x 200

400 x 400

Recticle Holder

Dimension	2"	3"	4"	5"	6"	8"
A - length	122 mm	145 mm	186 mm	239 mm	239 mm	313 mm
B - total width	80 mm	105 mm	132 mm	190 mm	190 mm	263 mm
C - width neck	80 mm	80 mm	80 mm	80 mm	84 mm	100 mm
D - thickness	12 mm	14 mm	14 mm	14 mm	15 mm	15 mm
E - compl. thickness	21 mm	22 mm	22 mm	22 mm	22 mm	24 mm
F - edge exclusion	5 mm	5 mm	5 mm	5 mm	5,5 mm	5,5 mm