Plating Units

Laboratory Settings

Features & Functions

4-inch-au-plating-with-lowest-electrolyte-volume

Individual design for small wafer or wafer segments

Lowest electrolyte volume

Simple operation

Perfect for R&D purpose

Safe handling of sensitive substrates, like i.e. GaN

Laboratory Settings Samples

4-inch-vacuum-setting-for-etching

4 Inch Vacuum Setting for Etching

Laboratory Settings
plating-2-inch-and-segmented-wafer

Plating 2 Inch and Segmented Wafer

Laboratory Settings
quarter-3-inch-plating

Quarter 3 Inch Plating

Laboratory Settings

All components used are available as spare parts. If required, please contact us directly.

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